Illumination device and display apparatus

ABSTRACT

An illumination device includes: a substrate; a first transparent electrode covering approximately an entire surface of a display region of the substrate; a second transparent electrode which overlaps with the first transparent electrode when seen in plan view and covers approximately the entire surface of the display region; and a plurality of island shaped light emitting elements disposed between the first transparent electrode and the second transparent electrode. The first and second transparent electrodes are formed as single continuous films.

This application claims priority to Japanese Patent Application No.2009-051618 filed Mar. 5, 2009 which is hereby expressly incorporated byreference herein in its entirety.

BACKGROUND

1. Technical Field

The present invention relates to an illumination device and a displayapparatus, and more particularly, to an illumination device and adisplay apparatus which include a pair of electrodes and light emittingelements.

2. Related Art

In the related art, an illumination device including a pair ofelectrodes and light emitting elements is known (for example, seeJP-A-2008-77864). The illumination device disclosed in JP-A-2008-77864includes a positive electrode which is formed of a pectinate transparentelectrode having a single body and a plurality of line shaped arms, anda negative electrode which is formed of a pectinate transparentelectrode having a single body which is disposed to intersect with thepectinate positive electrode and a plurality of line shaped arms. Lightemitting elements (organic electroluminescence elements) are providedbetween the arms of the positive electrode and the arms of the negativeelectrode in a location where the arms of the positive electrodeintersect the arms of the negative electrode.

However, in the illumination device disclosed in the JP-A-2008-77864,since the arms of the positive electrode and the arms of the negativeelectrode are formed to have line shapes, respectively, the electricalresistance of the positive electrode and the negative electrode becomeshigh.

SUMMARY

One advantage of the embodiments of the invention is that anillumination device and a display apparatus are provided that arecapable of preventing an increase of the electrical resistance ofelectrodes.

According to a first aspect, there is provided an illumination deviceincluding: a substrate; a first single film transparent electrode whichcovers approximately an entire surface of a display region of thesubstrate; a second single film transparent electrode which overlapswith the first single film transparent electrode when seen in plan viewand covers approximately the entire surface of the display region; and aplurality of island shaped light emitting elements disposed between thefirst and second single film transparent electrodes. Herein, the term“single film” means a continuous and solid layer devoid of any holespassing therethrough.

In the illumination device according to the first aspect, as describedabove, the first and second transparent electrodes are formed as singlefilms which cover approximately the entire surface of the displayregion. Accordingly, the electrical resistance of the first and secondtransparent electrodes may be prevented from increasing since the firstand second transparent electrodes are formed as single films in contrastto a plurality of line shaped electrodes.

Further, since the first and second transparent electrodes are formed assingle films covering approximately the entire surface of the displayregion, for example, it is possible to prevent moiré (a periodicalinterference pattern) which may be generated if the first and secondtransparent electrodes are formed as a plurality of line shapedelectrodes. In addition, since the first and second transparentelectrodes are formed as single films covering approximately the entiresurface of the display region, it is not necessary to process the firstand second transparent electrodes with a fine pattern, and thus, thefirst and second transparent electrodes may be easily formed. Moreover,since the first and second transparent electrodes are formed as singlefilms covering approximately the entire surface of the display region,electrode patterns may be prevented from being exposed (visualization)which may occur if the first and second transparent electrodes areformed as a plurality of line shaped electrodes.

In the illumination device according to the first aspect, it ispreferable that the first and second transparent electrodes have anapproximately rectangular shape. The first transparent electrode has afirst portion protruding from the second transparent electrode on oneside of the second transparent electrode when seen in plan view. Thesecond transparent electrode has a second portion protruding from thefirst electrode on another side opposite the one side. One of a positivevoltage and a negative voltage is supplied to the first portion of thefirst transparent electrode. The other of the positive and negativevoltage is supplied to the second portion of the second transparentelectrode. Since the first portion of the first transparent electrode(the protruded portion) is a continuous and uninterrupted layer, theelectrical resistance of the first transparent electrode may beprevented from increasing as compared with the case that the protrudedportion of the first transparent electrode is formed of a plurality ofline shaped electrodes and one of the positive voltage and the negativevoltage is supplied to the plurality of line shaped electrodes.

In the illumination device according to the first aspect, it ispreferable to further include an insulation film between the firsttransparent electrode and the second transparent electrode. The lightemitting elements are formed to be in direct contact with the first andsecond transparent electrodes via openings formed in the insulationfilm. With such a configuration, since the illumination device may beeasily embodied with a simple configuration, it is possible to simplifythe manufacturing process and to reduce costs.

In this case, it is preferable that the light emitting elements areformed to be in direct contact with one of the first transparentelectrode and the second transparent electrode, and island shapedelectrodes are formed between the other of the first and secondtransparent electrodes and the light emitting elements. With such aconfiguration, since the electrode on one side of the light emittingelements serves as the first transparent electrode and the otherelectrode thereof serves as the island shaped electrodes formed betweenthe light emitting elements and the second transparent electrode, thelight emitting efficiency of the light emitting elements may beincreased.

In the illumination device in which the insulation film is formedbetween the first and second transparent electrode, it is preferablethat the insulation film is disposed between the first and secondtransparent electrodes in a position where the first transparentelectrode overlaps with the second transparent electrode when seen inplan view, and is also arranged between the first and second transparentelectrodes in a position where a side surface of the first transparentelectrode is opposite to the second transparent electrode. With such aconfiguration, the first transparent electrode is insulated from thesecond transparent electrode, thereby positively preventing anelectrical short.

In the illumination device according to the first aspect, it ispreferable to further include a light shielding film and a reflectivefilm that overlap with the light emitting elements when seen in planview. The light shielding film is formed to be in direct contact withthe surface of the substrate, and the reflective film is formed on asurface of a side of the light shielding film which is opposite to thelight emitting elements. With such a configuration, the light shieldingfilm is formed to be in direct contact with the surface of thesubstrate, and thus, a photolithography process may be used and thelight shielding film may be easily patterned with a desired size,thereby preventing a decrease of an aperture ratio (a region into whichlight transmits) which may be generated in the case that the lightshielding film is formed with a size larger than the desired size.Moreover, the light shielding film is formed to overlap with the lightemitting element when seen in plan view. Accordingly, in a top emissiontype light emitting element in which light is emitted from the lightemitting element toward the second transparent electrode (in a directionopposite to the light shielding film), the light may be prevented frombeing leaked, by the light shielding film, in a direction which isopposite to the direction in which the light is emitted from the lightemitting element.

In the illumination device according to the first aspect, it ispreferable to further include a light shielding film and a reflectivefilm which overlap with each of the light emitting elements when seen inplan view. The reflective film is formed on the surface of the secondtransparent electrode, and the light shielding film is formed on thesurface of the reflective film. With such a configuration, in a bottomemission type light emitting element in which light is emitted from thelight emitting element toward the first transparent electrode (in thedirection opposite to the light shielding film), the light may beprevented from being leaked, by the light shielding film, in thedirection which is opposite to the direction in which the light isemitted from the light emitting element.

According to a second aspect, there is provided a display apparatusincluding an illumination device having any one of the above describedconfigurations. With such a configuration, since the illumination devicemay illuminate a reflective display panel or a semi-transmissive displaypanel from an observer side, moiré which may be generated byinterference between patterns of the display panel and patterns of theillumination device may be prevented. In addition, it is possible toobtain a display apparatus in which the electrical resistance of theelectrodes of the illumination device may be prevented from beingincreased.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will be described with reference to theaccompanying drawings, wherein like numbers reference like elements.

FIG. 1 is a sectional view illustrating an illumination device accordingto a first embodiment.

FIG. 2 is a plan view illustrating the illumination device according tothe first embodiment.

FIG. 3 is a sectional view illustrating the illumination deviceaccording to the first embodiment.

FIG. 4 is a sectional view illustrating a display apparatus according tothe first embodiment.

FIG. 5 is a sectional view illustrating the display apparatus accordingto a second embodiment.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

Hereinafter, a preferred embodiment will be described with reference tothe accompanying drawings.

First Embodiment

A configuration of a display apparatus 100 according to a firstembodiment will be described with reference to FIGS. 1 to 3.

As shown in FIG. 1, the display apparatus 100 according to the firstembodiment includes an illumination device 200 and a reflective liquidcrystal display apparatus 300.

As shown in FIG. 1, the illumination device 200 includes a substrate 11which is made of a transparent member such as glass, and a substrate 12which is made of a transparent member such as glass and is disposedopposite to the substrate 11. In the first embodiment, a light shieldingfilm 13 which is made of, for example, chromium (Cr), chromium oxide(CrO₂), or the like is formed on a surface of the substrate 12 whichfaces the reflective liquid crystal display apparatus 300 (in thedirection Z1). The light shielding film 13 prevents light emitted from alight emitting element 17, described later, from leaking in thedirection Z2. The light shielding film 13 is formed directly on thesurface of the substrate 12 by forming a film made of chromium (Cr),chromium oxide (CrO₂), or the like on the surface of the substrate 12and then patterning the film. As shown in FIG. 2, the light shieldingfilm 13 is formed to have an approximately rectangular shape and isprovided as a plurality of members. Moreover, the light shielding films13 are arranged as islands in a matrix shape on the surface of thesubstrate 12. As shown in FIG. 2, the light shielding films 13 areprovided to overlap with the light emitting elements 17.

In the first embodiment, as shown in FIG. 1, a reflective film 14 madeof metal such as Al is formed on the surface of each of the plurality oflight shielding films 13 and faces the reflective liquid crystal displayapparatus 300 (in the direction Z1). As shown in FIG. 2, the reflectivefilm 14 is formed to have an approximately rectangular shape. Further,light emitted from the light emitting elements 17, described later, thatis leaked in the direction Z2 is reflected by the reflective film 14 inthe direction Z1. As shown in FIG. 2, the reflective film 14 is formedto overlap with the light emitting elements 17 in plan view. The lightshielding film 13 is formed to be larger than the reflective film 14when seen in plan view and is arranged to protrude from the reflectivefilm 14.

In the first embodiment as shown in FIG. 1, a positive electrode 15 inthe form of a transparent electrode such as ITO (Indium Tin Oxide), IZO(Indium Zinc Oxide) or SnO₂ (tin oxide) is provided to cover the surfaceof the substrate 12, the light shielding film 13 and the reflective film14, and has an approximately rectangular shape comprising a single,solid and continuous film (a layer without any openings passingtherethrough). The positive electrode 15 is an example of a firsttransparent electrode. In addition, the positive electrode 15 has athickness t1 of approximately 30 nm or more to 200 nm or less.

In the first embodiment, as shown in FIG. 2, the positive electrode 15covers approximately the entire surface of a display region 12 a (aregion in which an image is displayed) of the substrate 12, and anon-display region 12 b disposed in a direction X2 with reference to thedisplay region 12 a, when seen in plan view. Moreover, the positiveelectrode 15 is formed to have an approximately rectangular shape tocover the plurality of light shielding films 13 (and reflective films14) which are arranged in a matrix shape, when seen in plan view.

As shown in FIG. 1, an insulation film 16 which is made of, for example,a silicon dioxide (SiO₂) film or a silicon nitride (SiN) film is formedon a surface of the positive electrode 15. In the first embodiment, theinsulation film 16 is disposed between the positive electrode 15 and anegative electrode 18, described later, in a location where the positiveelectrode 15 overlaps with the negative electrode 18. Further, theinsulation film 16 extends between the positive electrode 15 and thenegative electrode 18 in a position where a side surface 15 a of thepositive electrode 15 in the direction X1 is opposite to the negativeelectrode 18.

In addition, in the first embodiment, a plurality of contact holes 16 ais formed on the insulation film 16. The light emitting elements 17 madeof an organic layer are formed in the contact holes 16 a of theinsulation film 16 so as to be in direct contact with the positiveelectrode 15 and the negative electrode 18, described later. The contactholes 16 a are an example of openings. The light emitting elements 17are formed of an electron transport layer, a light emitting layer and ahole transport layer. Moreover, in the first embodiment, approximatelyan entire surface of one end 17 a of each light emitting element 17 (thesurface of each light emitting element 17 in the direction Z2) is formedto be in direct contact with the positive electrode 15, andapproximately an entire surface of the other end 17 b of each lightemitting element 17 (the surface of each light emitting element 17 inthe direction Z1) is formed to be in direct contact with the negativeelectrode 18.

The negative electrode 18 which is formed as a transparent electrodesuch as ITO, IZO or SnO₂ and has an approximately rectangular shapecomprising a single, solid and continuous film without any openingspassing therethrough is formed on a surface of the insulation film inthe direction Z1, and on a surface of the light emitting elements 17 inthe direction Z1. The negative electrode 18 is an example of a secondtransparent electrode. The negative electrode 18 has a thickness t2 ofapproximately 30 nm or more to 200 nm or less. As shown in FIG. 3, aportion of the negative electrode 18 in the direction X1 covers a sidesurface 16 b of the insulation film 16 in the direction X1 and coversthe surface of the substrate 12. In the first embodiment, the negativeelectrode 18 is formed to overlap with the positive electrode 15 andcovers approximately the entire surface of the display region 12 a whenseen in plan view, and the non-display region 12 b disposed in thedirection X1 with reference to the display region 12 a.

In the case that the positive electrode 15 or the negative electrode 18is formed of a semi-transmissive metal such as an aluminum layer (Allayer), a magnesium silver layer (MgAg layer), a silver layer (Ag layer)or a gold layer (Au layer), it is desirable to form thesemi-transmissive metal as a thin film of 20 nm or less so as to acquirelight transmission. In the case that the semi-transmissive metal isformed with a stepped portion, the semi-transmissive metal mayundesirably be cut in the stepped portion, but since the positiveelectrode 15 and the negative electrode 18 are formed with a thicknessof approximately 30 nm or more to 200 nm or less, the cutting of thepositive electrode 15 and the negative electrode 18 in any steppedportion can be prevented.

In the first embodiment, as shown in FIGS. 1 to 3, the positiveelectrode 15 includes a portion 15 b which protrudes (is exposed) fromthe negative electrode 18 when seen in plan view. The portion 15 b ofthe positive electrode 15 which protrudes from the negative electrode 18is continuous and uninterrupted and therefore covers approximately anentire surface of a region (the non-display region 12 b in the directionX2) where the positive electrode 15 protrudes from the negativeelectrode 18. That is, the portion 15 b of the positive electrode 15 hasa solid film shape without any openings (unlike line shaped electrodes).In addition, a positive voltage is supplied to the portion 15 b of thepositive electrode 15 which protrudes from the negative electrode 18.Moreover, a negative voltage is supplied to a region of the negativeelectrode 18 which is disposed opposite to the portion 15 b of thepositive electrode 15 (in the direction X1).

The positive voltage and the negative voltage are applied to thepositive electrode 15 and the negative electrode 18, respectively, andthus, light is emitted from the light emitting elements 17 in thedirection Z1. That is, a top emission type organic electroluminescenceelement (an organic EL element) 19 is formed by the positive electrode15, the light emitting elements 17 and the negative electrode 18.

As shown in FIG. 1, the substrate 11 and the substrate 12 are joined toeach other by a sealing layer 20. As shown in FIG. 2, the sealing layer20 is formed to surround the four edges of the substrate 11 and thesubstrate 12. Accordingly, the organic EL element 19 is enclosed in aspace which is surrounded by the substrate 11, the substrate 12 and thesealing layer 20. The space surrounded by the substrate 11, thesubstrate 12 and the sealing layer 20 may be filled with nitrogen andmay be filled with a member (such as resin) having approximately thesame refractive index as the substrate 11.

As shown in FIG. 4, in the reflective liquid crystal display apparatus300, a thin film transistor 32 for selecting pixels is formed on asurface of the substrate 31 made of glass. Further, a plurality ofpixels 33 are provided in the reflective liquid crystal displayapparatus 300. The thin film transistor 32 is formed for every pixel 33.The thin film transistor 32 is covered with an interlayer insulationfilm 34, and a pixel electrode 35 which is made of a reflective materialsuch as aluminum (Al) is formed on a surface of the interlayerinsulation film 34 so as to be connected to each thin film transistor32. The pixel electrode 35 is connected to the thin film transistor 32via a contact hole 34 a which is formed in the interlayer insulationfilm 34.

A substrate 41 made of glass is arranged to be opposite to the substrate31. A common electrode 42 which is formed of a transparent electrodesuch as ITO is formed on a surface of the substrate 41 toward thesubstrate 31 (in the direction Z1). The common electrode 42 covers theplurality of pixels 33. A liquid crystal layer 43 is enclosed betweenthe pixel electrode 35 and the common electrode 42. In addition, a lightscattering layer 44 including a diffusion cohesive layer, and adeflection plate 45 are sequentially stacked on the surface of thesubstrate 41 in the direction Z2. The light scattering layer 44approximately uniformly scatters light emitted from the illuminationdevice 200 to the reflective liquid crystal display apparatus 300.

The illumination device 200 and the reflective liquid crystal displayapparatus 300 are joined to each other with a resin layer 46 interposedtherebetween. The resin layer 46 is formed of, for example, anultraviolet (UV) cured resin layer or a visible light cured resin layerhaving approximately the same refractive index as the substrate 11 madeof glass. Accordingly, light may be prevented from being reflected in aboundary surface between the resin layer 46 and the substrate 11.

Next, an operation of the display apparatus 100 according to the firstembodiment will be described with reference to FIG. 4.

First, a positive voltage is applied to the positive electrode 15, andsimultaneously, a negative voltage is applied to the negative electrode18. Accordingly, light is emitted from the light emitting elements 17 inthe direction Z1. The light emitted from the light emitting elements 17is deflected in a predetermined direction by the deflection plate 45 andscattered by the light scattering layer 44. The light scattered by thelight scattering layer 44 passes through the substrate 41 made of glassand the common electrode 42 formed of the transparent electrode and thenenters into the liquid crystal layer 43. The light entered into theliquid crystal layer 43 is reflected in the direction Z2 by the pixelelectrode 35 made of a reflective material such as aluminum (Al).Further, the light reflected by the pixel electrode 35 passes through areverse path with respect to a path along which the light enters intothe reflective liquid crystal display apparatus 300, and then entersinto the illumination device 200. The light entered into theillumination device 200 is observed by an observer through the substrate11, the negative electrode 18 formed of the transparent electrode, theinsulation film 16, the positive electrode 15 formed of the transparentelectrode and the substrate 12. Accordingly, an image displayed on thereflective liquid display device 300 is observed by the observer.

In the first embodiment, as described above, the positive electrode 15and the negative electrode 18 are formed as single, continuous and solidfilms which cover approximately the entire surface of the display region12 a, and thus, the electrical resistance of the positive electrode 15and the negative electrode 18 may be prevented from being increased incontrast to the case that would exist if the positive and negativeelectrodes were formed as a plurality of line shaped electrodes.

Moreover, in the first embodiment, since the positive electrode 15 andthe negative electrode 18 are formed as single continuous films whichcover approximately the entire surface of the display region 12 a asdescribed above, for example, it is possible to prevent moiré (theperiodical interference pattern) generated by positive and negativeelectrodes which are formed as a plurality of line shaped electrodes. Inaddition, since the positive electrode 15 and the negative electrode 18are formed of single continuous films which cover approximately theentire surface of the display region 12 a, it is not necessary toprocess the positive electrode 15 and the negative electrode 18 with afine pattern, and thus, the positive electrode 15 and the negativeelectrode 18 may be easily formed. Further, since the positive electrode15 and the negative electrode are formed of single continuous filmswhich cover approximately the entire surface of the display region 12 a,the patterns of the electrodes may be prevented from being exposed(visualization) which is, for example, unlike the case that could occurif the positive and negative electrodes were formed as a plurality ofline shaped electrodes.

Further, in the first embodiment, as described above, the light emittingelements 17 are arranged as islands in a matrix shape, and the lightemitting elements 17 arranged in the matrix shape are arranged betweenthe positive electrode 15 which covers approximately the entire surfaceof the display region 12 a and the negative electrode 18 which coversapproximately the entire surface of the display region 12 a.Accordingly, since the light emitting elements 17 are electricallyconnected with the positive electrode 15 and the negative electrode 18which are formed as single films, respectively, the electricalresistance of the positive electrode 15 and the negative electrode 18may be prevented from being increased which is, for example, unlike thecase that could occur if the light emitting elements arranged as islandsin a matrix shape were electrically connected with a plurality of lineshaped electrodes.

In the first embodiment, as described above, the positive electrode 15has the portion 15 b which protrudes from the negative electrode 18 whenseen in plan view, and the portion 15 b of the positive electrode 15which protrudes from the negative electrode 18 covers approximately anentire surface of a region in which the positive electrode 15 protrudesfrom the negative electrode 18. Further, the positive voltage issupplied to the portion 15 b of the positive electrode 15 whichprotrudes from the negative electrode 18, and the negative voltage issupplied to the region of the negative electrode 18 which is disposedopposite to the portion 15 b of the positive electrode 15 whichprotrudes from the negative electrode 18. Accordingly, since the portion15 b of the positive electrode 15 which protrudes from the negativeelectrode 18 covers approximately the entire surface of the region wherethe positive electrode 15 protrudes from the negative electrode 18, theelectrical resistance between the positive electrode 15 and the positivevoltage may be prevented from being increased which is different, forexample, as compared with the case that could occur if a portion of apositive electrode which protrudes from a negative electrode is formedas a plurality of line shaped electrodes, and the positive voltage issupplied to the plurality of line shaped electrodes.

Further, in the first embodiment, as described above, the positiveelectrode 15 and the negative electrode 18 are sequentially stacked onthe substrate 12. However, the negative electrode 18 and the positiveelectrode 15 may be sequentially stacked on the substrate 12. Inaddition, the positive electrode 15 and the negative electrode 18 may beformed of the same material or different materials.

In the first embodiment, as described above, the light emitting elements17 are formed to be in direct contact with the positive electrode 15,and the electrode made of an island shaped metal or the like is formedbetween the negative electrode 18 and the light emitting elements 17,and thus, the light emitting efficiency of the light emitting elements17 may be increased. In addition, in this case, the island shapedelectrodes may be formed of a reflective film made of metal or the like,thereby omitting the reflective film 14.

Further, in the first embodiment, as described above, the insulationfilm 16 is disposed between the positive electrode 15 and the negativeelectrode 18 in a location where the positive electrode 15 overlaps withthe negative electrode 18 when seen in plan view, and is arrangedbetween the positive electrode 15 and the negative electrode 18 in aposition where the side surface 15 a of the positive electrode 15 isopposite to the negative electrode 18. Accordingly, the positiveelectrode 15 is insulated from the negative electrode 18, therebypositively preventing an electrical short.

In the first embodiment, as described above, the light shielding film 13is formed to be in direct contact with the surface of the substrate 12,and thus, a photolithography process may be used and the light shieldingfilm 13 may be easily patterned with a desired size, for example, unlikethe case that a light shielding film is formed on the surface of thetransparent electrode, thereby preventing a decrease of the apertureratio (the region into which light transmits), which may be generated inthe case that a light shielding film is formed with a size larger thanthe desired size. Moreover, the light shielding film 13 is formed tooverlap with the light emitting elements 17 when seen in plan view.Accordingly, in the top emission type light emitting elements 17 inwhich light is emitted from the light emitting elements 17 toward thenegative electrode 18 (in the direction opposite to the light shieldingfilm 13), the light may be prevented from being leaked, by the lightshielding film 13, in the direction (in the direction Z2 in FIG. 4)which is opposite to the direction in which the light is emitted fromthe light emitting elements 17.

Second Embodiment

Next, a second embodiment will be described with reference to FIG. 5. Inthe second embodiment, unlike the first embodiment, a display apparatus110 which includes a bottom emission type light emitting element 53 willbe described.

As shown in FIG. 5, the display apparatus 110 according to the secondembodiment of the present includes an illumination device 210 and areflective liquid crystal display apparatus 300.

The illumination device 210 includes a substrate 11 which is made of atransparent member such as glass and a substrate 12 which is made of atransparent member such as glass and is disposed opposite to thesubstrate 11. A positive electrode 51 in the form of a transparentelectrode such as ITO, IZO or SnO₂ and comprises a single, continuousand solid film is formed on the surface of the substrate 11 in adirection Z2. Herein, the positive electrode 51 is an example of a firsttransparent electrode.

In addition, an insulation film 52 which is made of a silicon dioxidefilm or a silicon nitride film is formed on a surface of the positiveelectrode 51. A plurality of contact holes 52 a is formed in theinsulation film 52. Light emitting elements 53 which are made of anorganic layer are formed in the contact holes 52 a of the insulationfilm 52 so as to be in direct contact with the positive electrode 51 anda negative electrode 54, described later. The contact holes 52 a are anexample of openings. Further, in the second embodiment, approximately anentire surface of one end 53 a of each light emitting element 53 (thesurface of each light emitting element 53 in a direction Z1) is formedto be in direct contact with the positive electrode 51, andapproximately an entire surface of the other end 53 b of each lightemitting element 53 (the surface of each light emitting element 53 inthe direction Z2) is formed to be in direct contact with the negativeelectrode 54. In addition, in the second embodiment, an upper surface 53c of each light emitting element 53 (the surface of each light emittingelement 53 in the direction Z2) and a side surface 53 d connected to theupper surface 53 c are formed to be in direct contact with the negativeelectrode 54.

Further, the negative electrode 54 which is in the form of a transparentelectrode such as ITO, IZO or SnO₂ and comprises a single, continuousand solid film without any openings is formed on a surface of theinsulation film 52 in the direction Z2, and on a surface of the lightemitting elements 53 in the direction Z2. Herein, the negative electrode54 is an example of a second transparent electrode according to thesecond embodiment. The negative electrode 54, like the negativeelectrode 18 according to the first embodiment shown in FIG. 2, coversapproximately an entire surface of a display region 12 a and anon-display region 12 b disposed in a direction X1 from the displayregion 12 a.

In addition, in the second embodiment, a reflective film 55 which ismade of metal such as aluminum (Al) is formed on a surface of thenegative electrode 54 to overlap with the light emitting elements 53when seen in plan view. A light shielding film 56 which is formed ofchrome, chrome oxide, or the like is provided on a surface of thereflective film 55 in the direction Z2. The light shielding film 56 isformed to be larger than the reflective film 55 when seen in plan view.The light shielding film 56, like the light shielding film 13 accordingto the first embodiment shown in FIG. 2, is arranged to protrude fromthe reflective film 55.

Further, a positive voltage and a negative voltage are applied to thepositive electrode 51 and the negative electrode 54, respectively, andthus, light is emitted from the light emitting elements 53 in thedirection Z1. That is, a bottom emission type organic EL element 57 isformed by the positive electrode 51, the light emitting elements 53 andthe negative element 54.

The remaining configuration of the second embodiment is the same as thefirst embodiment.

In the second embodiment, as described above, the reflective film 55 isformed on the surface of the negative electrode 54, and the lightshielding film 56 is formed on the surface of the reflective film 55.Accordingly, in the bottom emission type light emitting elements 53 inwhich the light is emitted from the light emitting elements 53 towardthe positive electrode 51 (in a direction opposite to the lightshielding film 56), the light may be prevented from being leaked in adirection (in the direction Z2 in FIG. 5) which is opposite to adirection in which the light is emitted from the light emitting elements53, by the light shielding film 56.

The other advantages and effects in the second embodiment are the sameas the first embodiment.

It should be noted that the above described embodiments are notlimitative but illustrative in various aspects. The scope of theinvention is defined not by the above described embodiments but by theaccompanying claims. In addition, it is possible to adopt variousmodifications in meaning and boundary that are equivalent to the scopeof the accompanying claims.

For example, in the first embodiment and the second embodiment, examplesin which light emitting elements made of an organic layer areillustrated, but the invention is not limited thereto. Alternatively,light emitting elements other than those of an organic layer may beemployed.

In addition, in the first embodiment and the second embodiment, examplesin which the plurality of light emitting elements is arranged in amatrix shape are illustrated, but the invention is not limited thereto.

Alternatively, the light emitting elements may be arranged in anirregular matrix shape other than a regular matrix shape.

Moreover, in the first embodiment and the second embodiment, thepositive electrode is formed on the surface of the substrate and thenegative electrode is formed to be opposite to the positive electrodewith the insulation film interposed therebetween, but the invention isnot limited thereto. Alternatively, the negative electrode may be formedon the surface of the substrate and the positive electrode may be formedto be opposite to the negative electrode with the insulation filminterposed therebetween.

Further, in the first embodiment and the second embodiment, the entiresurface of one end of each light emitting element and the entire surfaceof the other end thereof are formed to be in direct contact with thepositive electrode and the negative electrode, respectively, but theinvention is not limited thereto. Alternatively, the positive electrodeand the negative electrode may be formed to be in direct contact with aportion of the one end of a light emitting element and a portion of theother end thereof, respectively.

Moreover, in the first embodiment and the second embodiment, examples inwhich the positive electrode has the portion protruding from thenegative electrode when seen in plan view are illustrated, but theinvention is not limited thereto. Alternatively, the positive electrodeand the negative electrode may have approximately the same size and maybe arranged so that the positive electrode is not protruding from thenegative electrode.

In the first embodiment and the second embodiment, the reflective liquidcrystal display apparatus is exemplified, but the invention is notlimited thereto. Alternatively, a semi-transmissive liquid crystaldisplay apparatus may be employed.

1. An illumination device comprising: a substrate having a displayregion; a first single film transparent electrode covering approximatelyan entire surface of the display region; a second single filmtransparent electrode which overlaps with the first transparentelectrode when seen in plan view and covers approximately the entiresurface of the display region; and a plurality of island shaped lightemitting elements disposed between the first and second transparentelectrodes.
 2. The illumination device according to claim 1, wherein thefirst transparent electrode and the second transparent electrode haveapproximately rectangular shapes, wherein the first transparentelectrode has a first portion protruding from one side of the secondtransparent electrode when seen in plan view, wherein the secondtransparent electrode has a second portion protruding from the firsttransparent electrode at an opposite side as the one side, and whereinone of a positive voltage and a negative voltage is supplied to thefirst portion of the first transparent electrode, and the other of thepositive voltage and the negative voltage is supplied to the secondportion of the second transparent electrode.
 3. The illumination deviceaccording to claim 1, further comprising an insulation film disposedbetween the first transparent electrode and the second transparentelectrode, and wherein the light emitting elements are in direct contactwith the first transparent electrode and the second transparentelectrode via openings formed in the insulation film.
 4. Theillumination device according to claim 1, wherein the light emittingelements are in direct contact with one of the first transparentelectrode and the second transparent electrode, and island shapedelectrodes are formed between the light emitting elements and the otherof the first transparent electrode and the second transparent electrode.5. The illumination device according to claim 3, wherein the insulationfilm is disposed in a location where the first transparent electrodeoverlaps with the second transparent electrode when seen in plan view,and where a side surface of the first transparent electrode is oppositeto the second transparent electrode.
 6. The illumination deviceaccording to claim 1, further comprising a light shielding film and areflective film provided to overlap with each of the light emittingelements when seen in plan view, wherein the light shielding film is indirect contact with a surface of the substrate, and the reflective filmis formed on a surface of the light shielding film which is opposite tothe light emitting elements.
 7. The illumination device according toclaim 1, further comprising a light shielding film and a reflective filmprovided to overlap with each of the light emitting elements when seenin plan view, wherein the reflective film is provided on a surface ofthe second transparent electrode, and the light shielding film isprovided on a surface of the reflective film.
 8. A display apparatuscomprising the illumination device according to claim 1 which isprovided on an observer side of a reflective display panel or asemi-transmissive display panel.
 9. An illumination device comprising: asubstrate having a display region; a first transparent electrodecovering substantially an entire surface of the display region, thefirst transparent electrode being a solid film; a second transparentelectrode overlapping the first transparent electrode in plan view andcovering substantially the entire surface of the display region, thesecond transparent electrode being a solid film; and a plurality ofisland shaped light emitting elements between the first and secondtransparent electrodes.
 10. The illumination device according to claim9, further comprising: an insulation film disposed between the firsttransparent electrode and the second transparent electrode, theinsulation film including a plurality of openings passing therethrough,wherein the light emitting elements are formed in openings of theinsulation film and directly contact the first transparent electrode andthe second transparent electrode.
 11. An illumination device comprising:a substrate having a display region; a first transparent electrodesubstantially covering an entire surface of the display region, thefirst transparent electrode being a first continuous layer; a secondtransparent electrode overlapping the first transparent electrode inplan view and substantially covering the entire surface of the displayregion, the second transparent electrode being a second continuouslayer; and a plurality of island shaped light emitting elements betweenthe first and second transparent electrodes.
 12. The illumination deviceaccording to claim 11, further comprising: an insulation film disposedbetween the first transparent electrode and the second transparentelectrode, the insulation film including a plurality of openings passingtherethrough, wherein the light emitting elements are formed in openingsof the insulation film and directly contact the first transparentelectrode and the second transparent electrode.